Extreme ultraviolet microscope characterization using photomask surface roughness
نویسندگان
چکیده
منابع مشابه
System-level line-edge roughness limits in extreme ultraviolet lithography
As critical dimensions shrink, line edge and width roughness (LER and LWR) become of increasing concern. Traditionally LER is viewed as a resist-limited effect; however, as critical dimensions shrink and LER requirements become proportionally more stringent, system-level effects begin to play an important role. Recent advanced EUV resist testing results have demonstrated lower bounds on achieva...
متن کاملSurface roughness effects on aluminium-based ultraviolet plasmonic nanolasers
We systematically investigate the effects of surface roughness on the characteristics of ultraviolet zinc oxide plasmonic nanolasers fabricated on aluminium films with two different degrees of surface roughness. We demonstrate that the effective dielectric functions of aluminium interfaces with distinct roughness can be analysed from reflectivity measurements. By considering the scattering loss...
متن کاملUltrafast extreme ultraviolet holography: dynamic monitoring of surface deformation.
We demonstrate femtosecond time-resolved dynamic Gabor holography using highly coherent extreme ultraviolet light generated by high harmonic upconversion of a femtosecond laser. By reflecting this light from an impulsively heated surface, we implement a simple and robust single-reflection geometry for phase-sensitive holographic detection at extreme UV wavelengths. Using this setup, we study th...
متن کاملMethod for the Characterization of Extreme-Ultraviolet Photoresist Outgassing
Outgassing from photoresists illuminated by extreme ultraviolet radiation can lead to degradation of the very expensive multilayer-coated optics in an extreme ultraviolet stepper. Reliable quantification of the various organic molecules outgassed by photoresists has been a challenging goal. We have designed a compact system for this measurement. In the first step, the total number of molecules ...
متن کاملDesign, fabrication, and characterization of high-efficiency extreme-ultraviolet diffusers.
As the development of extreme-ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. Because of the strong absorption of EUV by most materials and because of its extremely short wavelength, however, it is difficult to implement many components that are commonplace in the longer-wavelength regimes. One such example is the di...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Scientific Reports
سال: 2020
ISSN: 2045-2322
DOI: 10.1038/s41598-020-68588-w